{"id":5298,"date":"2026-08-04T15:25:59","date_gmt":"2026-08-04T06:25:59","guid":{"rendered":"https:\/\/www.aem.imr.tohoku.ac.jp\/?page_id=5298"},"modified":"2026-08-04T15:35:58","modified_gmt":"2026-08-04T06:35:58","slug":"plasma-focused-ion-beam-system-tescan-amber-x","status":"publish","type":"page","link":"https:\/\/www.aem.imr.tohoku.ac.jp\/en\/plasma-focused-ion-beam-system-tescan-amber-x\/","title":{"rendered":"Plasma Focused Ion Beam System TESCAN AMBER X"},"content":{"rendered":"<p><em>*Note: This page was translated by AI from the Japanese original. In case of any discrepancy, the Japanese version shall prevail.*<\/em><\/p>\n<div class=\"equipment-header\" style=\"text-align: center; margin-bottom: 2em;\">\n  <img decoding=\"async\" class=\"aligncenter size-medium\" src=\"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-content\/uploads\/2024\/06\/TESCAN\u5916\u89b3-2-1024x770.jpg\" alt=\"Plasma Focused Ion Beam System AMBER X appearance\" style=\"max-width: 100%; height: auto; border-radius: 8px; box-shadow: 0 4px 12px rgba(0,0,0,0.1);\" \/>\n<\/div>\n<h2 style=\"border-bottom: 2px solid #0056b3; padding-bottom: 6px; margin-top: 1.5em; color: #0056b3;\">Overview<\/h2>\n<div style=\"line-height: 1.8; font-size: 1.05em;\">\n<p>The TESCAN <strong>AMBER X<\/strong> is a focused ion beam (FIB) system combining an SEM equipped with a high-brightness Schottky electron gun and a dual-beam Xe plasma FIB. Its Ga-free plasma ion source enables high-current, wide-area, high-speed machining.<\/p>\n<p>Equipped with a rocking stage and an OptiLift micromanipulator, it supports micro-sampling and 3D structural analysis via serial sectioning. It also supports TOF-SIMS analysis using the FIB as the primary ion source.<\/p>\n<\/div>\n<h2 style=\"border-bottom: 2px solid #0056b3; padding-bottom: 6px; margin-top: 1.5em; color: #0056b3;\">Features<\/h2>\n<ul style=\"line-height: 1.8; padding-left: 1.2em;\">\n<li style=\"margin-bottom: 0.8em;\"><strong>Dual-Beam Xe Plasma FIB:<\/strong> The Ga-free plasma ion source enables higher-current, wider-area, faster machining than conventional Ga-FIB systems.<\/li>\n<li style=\"margin-bottom: 0.8em;\"><strong>Rocking Stage:<\/strong> Supports observation and machining while rocking (tilting) the specimen.<\/li>\n<li style=\"margin-bottom: 0.8em;\"><strong>OptiLift Micromanipulator:<\/strong> Specimen pickup (micro-sampling) with attitude control.<\/li>\n<li style=\"margin-bottom: 0.8em;\"><strong>TOF-SIMS Analysis:<\/strong> Supports time-of-flight secondary ion mass spectrometry using the FIB as the primary ion source.<\/li>\n<li style=\"margin-bottom: 0.8em;\"><strong>Serial Sectioning (3D Structural Analysis):<\/strong> Reconstructs 3D images from a series of SEM cross-sectional images.<\/li>\n<li style=\"margin-bottom: 0.8em;\"><strong>Protective Coating:<\/strong> Supports Pt and C deposition as a pre-machining protective coating to reduce FIB damage.<\/li>\n<li style=\"margin-bottom: 0.8em;\"><strong>Backscattered Electron Detector &amp; EDS Analysis:<\/strong> Also supports compositional contrast imaging and elemental analysis.<\/li>\n<\/ul>\n<h2 style=\"border-bottom: 2px solid #0056b3; padding-bottom: 6px; margin-top: 1.5em; color: #0056b3;\">Specifications<\/h2>\n<div style=\"background-color: #fff9e6; border-left: 4px solid #ff9800; padding: 10px 14px; margin: 1em 0; border-radius: 4px; font-size: 0.95em; line-height: 1.6;\">\n  <strong style=\"color: #d97706;\">[Specification Notice]<\/strong><br \/>\n  Actual equipment configurations or specifications may differ from standard manual specifications. Please consult the equipment manager for details regarding current capabilities and conditions of use.\n<\/div>\n<table style=\"width: 100%; border-collapse: collapse; margin-top: 1em; font-size: 0.95em;\">\n<tbody>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Manufacturer<\/th>\n<td style=\"padding: 10px;\">TESCAN (Czech Republic) \/ Japan distributor: Toyo Corporation<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Model<\/th>\n<td style=\"padding: 10px;\">AMBER X (Dual-Beam Xe Plasma FIB-SEM)<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Electron Gun<\/th>\n<td style=\"padding: 10px;\">High-brightness Schottky electron gun (accelerating voltage 0.5&#8211;30 kV)<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Ion Gun<\/th>\n<td style=\"padding: 10px;\">Xe plasma ion gun (accelerating voltage 1&#8211;30 kV, beam current 1 pA&#8211;3 &#181;A)<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Protective Coating<\/th>\n<td style=\"padding: 10px;\">Pt and C deposition<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Specimen Pickup<\/th>\n<td style=\"padding: 10px;\">OptiLift (attitude-controlled micromanipulator)<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Stage<\/th>\n<td style=\"padding: 10px;\">Rocking stage<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">3D Reconstruction<\/th>\n<td style=\"padding: 10px;\">Serial sectioning<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Analysis \/ Detectors<\/th>\n<td style=\"padding: 10px;\">Backscattered electron detector, EDS, TOF-SIMS (using the FIB as the primary ion source)<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Max. Specimen Size<\/th>\n<td style=\"padding: 10px;\">120 mm diameter (max. 1 mm machining width at once)<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Funding Category<\/th>\n<td style=\"padding: 10px;\">ARIM<\/td>\n<\/tr>\n<tr style=\"border-bottom: 1px solid #e0e0e0;\">\n<th style=\"width: 28%; padding: 10px; background-color: #f8f9fa; text-align: left; font-weight: bold; border-right: 1px solid #e0e0e0;\">Location<\/th>\n<td style=\"padding: 10px;\">Room 2-612<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<h2 style=\"border-bottom: 2px solid #0056b3; padding-bottom: 6px; margin-top: 1.5em; color: #0056b3;\">Manuals &amp; Guidelines<\/h2>\n<div style=\"background-color: #f0f7ff; border-left: 4px solid #0056b3; padding: 12px 16px; margin-top: 1em; border-radius: 4px; line-height: 1.7;\">\n<p style=\"margin: 0;\"><strong>[Manuals &amp; Guidelines]<\/strong><br \/>Manuals are planned for release at a later date and are not yet publicly available. For inquiries regarding instrument use, please contact the equipment manager.<\/p>\n<\/div>\n","protected":false},"excerpt":{"rendered":"<p>*Note: This page was translated by AI from the Japanese original. In case of any discrepancy, the Japanese version shall prevail.* Overview The TESCAN AMBER X is a focused ion beam (FIB) system combining an SEM equipped with a high-brightness Schottky electron gun and a dual-beam Xe plasma FIB. Its Ga-free plasma ion source enables <a href=\"https:\/\/www.aem.imr.tohoku.ac.jp\/en\/plasma-focused-ion-beam-system-tescan-amber-x\/\" class=\"more-link\">&#8230;<span class=\"screen-reader-text\">  Plasma Focused Ion Beam System TESCAN AMBER X<\/span><\/a><\/p>\n","protected":false},"author":11,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_locale":"en_US","_original_post":"5296","footnotes":""},"class_list":["post-5298","page","type-page","status-publish","hentry","en-US"],"_links":{"self":[{"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/pages\/5298","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/users\/11"}],"replies":[{"embeddable":true,"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/comments?post=5298"}],"version-history":[{"count":2,"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/pages\/5298\/revisions"}],"predecessor-version":[{"id":5305,"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/pages\/5298\/revisions\/5305"}],"wp:attachment":[{"href":"https:\/\/www.aem.imr.tohoku.ac.jp\/wp-json\/wp\/v2\/media?parent=5298"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}