Osmium coater NEOC-PRO

*Note: This page was translated by AI from the Japanese original. In case of any discrepancy, the Japanese version shall prevail.*

Osmium Coater NEOC-PRO appearance

Overview

The Meiwafosis Osmium Coater NEOC-PRO is a precision specimen preparation system that deposits extremely thin, uniform, and conductive osmium (Os) metal films onto non-conductive samples using a plasma CVD process.

Unlike traditional gold (Au) or platinum (Pt) sputtering, osmium coating generates amorphous, grain-free films that prevent particulate artifacts under high-resolution FE-SEM imaging even at ultra-high magnifications.

Features

  • Amorphous, Grain-Free Ultra-Thin Film: Deposits smooth conductive osmium coatings without metallic granularity, ideal for ultra-high-magnification FE-SEM inspection.
  • Exceptional 3D Coverage: The vapor-phase plasma process uniformly coats complex geometries, porous media, and deep topographies.
  • Automated Vacuum & Discharge Control: Microprocessor-controlled operations ensure high repeatability and ease of use.
  • Recommended Operating Parameters: Discharge current: 5 mA, Vacuum: 10 Pa, Discharge duration: 90 seconds.

Specifications

[Specification Notice]
Actual equipment configurations or specifications may differ from standard manual specifications. Please consult the equipment manager for details regarding current capabilities and conditions of use.
Manufacturer Meiwafosis Co., Ltd.
Model NEOC-PRO (Osmium Coater)
Coating Method Plasma CVD (Osmium film)
Recommended Conditions Discharge Current: 5 mA / Vacuum: 10 Pa / Duration: 90 s
Target Source Osmium (Os)
Primary Applications Conductive coating of non-conductive specimens for high-magnification FE-SEM
Location Room 1-111

Manuals & Guidelines